Special magasi
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, inozivikanwawo segasi rinoseka, ikemikari ine njodzi ine kemikari formula N2O. Igasi risina ruvara, rinonhuwirira zvinotapira. N2O ioxidant inogona kutsigira kupisa mune mamwe mamiriro ezvinhu, asi inogadzikana pakamuri tembiricha uye ine kadiki diki yekutindivadza. , uye anogona kuseka vanhu. -
Carbon Tetrafluoride (CF4)
Carbon tetrafluoride, inozivikanwawo setetrafluoromethane, igasi risina ruvara patembiricha yakajairika uye kumanikidza, isinganyungudika mumvura. CF4 gasi parizvino ndiyo inonyanya kushandiswa plasma etching gasi muindasitiri yemicroelectronics. Inoshandiswawo selaser gasi, cryogenic refrigerant, solvent, lubricant, insulating material, uye inotonhorera kune infrared detector tubes. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gasi rine muchetura, rinonyanya kushandiswa semushonga wezvipembenene. Nekuti sulfuryl fluoride ine hunhu hwekupararira kwakasimba uye kupindirana, yakakura-spectrum mishonga yekuuraya zvipembenene, yakaderera dosage, yakaderera yasara huwandu, kukurumidza kuuraya zvipembenene, ipfupi gasi rekuparadzira nguva, kushandiswa kuri nyore pakudziya kwakaderera, kusakanganisa kumera uye kuderera kwehupfu, zvakanyanya. Inonyanya kushandiswa zvakanyanya mumatura, ngarava dzinotakura zvinhu, zvivakwa, madhamu emvura, kudzivirira mujuru, nezvimwe. -
Silane (SiH4)
Silane SiH4 igasi risina ruvara, rine muchetura uye rinonyanya kushanda rakadzvanywa gasi patembiricha yakajairika uye kumanikidza. Silane inoshandiswa zvakanyanya mukukura epitaxial yesilicon, mbishi zvinhu zvepolysilicon, silicon oxide, silicon nitride, nezvimwewo, masero ezuva, optical fibers, kugadzira girazi remavara, uye kemikari vapor deposition. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, gasi kuchena: 99.999%, inowanzoshandiswa sezvokudya aerosol propellant uye svikiro gasi. Inowanzoshandiswa semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) process, C4F8 inoshandiswa sechinotsiva CF4 kana C2F6, inoshandiswa sekuchenesa gasi uye semiconductor process etching gasi. -
Nitric oxide (NO)
Nitric oxide gasi musanganiswa wenitrogen ine kemikari formula NO. Igasi risina ruvara, risinganhuhwi, rine chepfu risinganyunguriki mumvura. Nitric oxide ikemikari inoshanda zvakanyanya uye inopindirana neokisijeni kuumba gasi rinoparadza nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gasi igasi risina ruvara uye rinonhuwa. Mushonga wayo une aqueous unonzi hydrochloric acid, inozivikanwawo se hydrochloric acid. Hydrogen chloride inonyanya kushandiswa kugadzira dhayi, zvinonhuhwirira, mishonga, akasiyana chlorides uye corrosion inhibitors. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, kemikari formula: C3F6, igasi risina ruvara pane yakajairika tembiricha uye kumanikidza. Inonyanya kushandiswa kugadzirira akasiyana fluorine-ine yakanaka makemikari zvigadzirwa, mishonga yepakati, yekudzima moto, nezvimwe, uye inogona zvakare kushandiswa kugadzira fluorine-ine polymer zvinhu. -
Amoniya (NH3)
Liquid ammonia / anhydrous ammonia yakakosha kemikari mbishi zvinhu zvine huwandu hwakasiyana hwekushandisa. Liquid ammonia inogona kushandiswa sefiriji. Inonyanya kushandiswa kugadzira nitric acid, urea nemamwe mafetereza emakemikari, uye inogona zvakare kushandiswa seyakabikwa yemishonga nemishonga yezvipembenene. Muindasitiri yekudzivirira, inoshandiswa kugadzira mapropellants emaroketi nemakomba.
