Magasi akakosha
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Sulfut tetrafluoride (SF4)
Einecs no: 232-013-4
CAT HAPANA: 7783-60-0 -
Nitrous oxide (n2o)
Nitrous oxide, inozivikanwa zvakare seyekuseka gasi, immisvo ine njodzi ine makemal formula n2o. Iyo isina ruvara, inotapira-inonhuhwirira gasi. N2O ndeye oxidant iyo inogona kutsigira kuchinjika pasi pemamwe mamiriro, asi yakagadzikana pamhepo tembiricha uye ine zvishoma anesthetic mhedzisiro. , uye inogona kuseka vanhu kuseka. -
Carbon tetrafluoride (cf4)
Kabhoni tetrafluoriori, anozivikanwawo seTetrafluorluorhane, gasi risina ruvara pane yakajairika tembiricha nekumanikidzwa, kusakwana mumvura. CF4 Gasi parizvino iri iyo inonyanya kushandiswa plasma etching gasi mune iyo micrEyelectronics indasitiri. Izvo zvinoshandiswawo seganda renhema, cryogenic firiji, solvent, lubricant, ichinzvera zvinhu, uye inotonhorera yezvinhu zvevanoita. -
Sulfuryl Fluoride (F2o2s)
Sulfuryl fluoride so2f2, gasi rine muchetura, inonyanya kushandiswa sechipembenene. Nekuti Sulfuryl Fluoride ine hunhu hwekusimba kwakasimba uye kubvumirana, kushanduka kwepfuma etc. -
Silane (Sih4)
Silane Sih4 is aless, ine chepfu uye inoshanda inoshanda gasi pane yakajairika tembiricha nekumanikidzwa. Silane inoshandiswa zvakanyanya muEpitaxial kukura kweiyo silicon, silicon oxide, silicon nitide, etc. -
Octafluorokococobit (c4f8)
Octafluerocuccyclourclobury C4f8, gasi kuchena: 99.999%, kazhinji inoshandiswa seyakagadzirwa eerosol propellant uye yepakati gasi. Izvo zvinowanzoshandiswa muSemiconductor Pecvd (Plasma kusimudzira. Cemical Vapor Deposition) Maitiro, C4F8, inoshandiswa segesi yekuchenesa uye semicononductor process etching gasi. -
Nitric oxide (kwete)
Nitric oxide gasi chikamu che nitrogen nemakemikari formula kwete. Iyo isina ruvara, isina kusimba, ine chepfu gasi iro risingazungunu mumvura. Nitric oxide inonyatso tsanangudza uye inobata neokisijeni kuti iite iyo yakawedzera gasi nitrogen dioxide (no₂). -
Hydrogen chloride (HCL)
Hydrogen chloride hcl gasi igasi isina ruvara ine unonhuhwirira. Mhinduro yayo yemvura inonzi iyo hydrochloric acid, inozivikanwa zvakare se hydrochloric acid. Hydrogen chloride inonyanya kushandiswa kugadzira dhayi, zvinonhuwira, mishonga, dzakasiyana-siyana chlorides uye corrosion inhibitors. -
Hexafluerororopropylene (c3f6)
Hexafluerororopropylene, makemikari formula: C3f6, gasi risina ruvara pane yakajairika tembiricha nekumanikidzwa. Izvo zvinonyanya kushandiswa kugadzirira dzakasiyana-siyana dzeFluorine-rine zvigadzirwa zvemakemikari, mishonga yemishonga, moto wekudzima moto, etc., uye inogona zvakare kushandiswa kugadzirira furuorine-ine polymer zvinhu. -
Ammonia (NH3)
Liquid Ammonia / Anhydrous Ammonia chinhu chakakosha chemakemikari zvinhu zvine huwandu hwakawanda hwekushandisa. Liquid Ammonia inogona kushandiswa sefariji. Izvo zvinonyanya kushandiswa kuburitsa nitric acid, Urea uye mamwe makemikari feteraiza, uye inogona zvakare kushandiswa seyakaisa zvinhu zvekurapa nemishonga yekuuraya zvipuka. Mune indasitiri yekudzivirira, inoshandiswa kugadzira mirepa emaroki uye mikanda.
