Magasi Akakosha
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Sarufa Tetrafluoride (SF4)
Nhamba yeEINECS: 232-013-4
Nhamba yeCAS: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, inozivikanwawo segasi rekuseka, ikemikari ine njodzi ine fomura yekemikari N2O. Igasi risina ruvara, rinonhuhwirira zvakanaka. N2O ioxydant inogona kutsigira kutsva pasi pemamwe mamiriro ezvinhu, asi inogara yakagadzikana patembiricha yemumba uye ine mhedzisiro shoma yekunzwa kurwadziwa. , uye inogona kuita kuti vanhu vaseke. -
Kabhoni Tetrafluoride (CF4)
Carbon tetrafluoride, inozivikanwawo setetrafluoromethane, igesi risina ruvara kana tembiricha yakajairika uye kumanikidzwa, isinganyungudike mumvura. Gasi reCF4 parizvino ndiro gasi rinoshandiswa zvakanyanya muindasitiri ye microelectronics. Rinoshandiswawo segasi re laser, cryogenic refrigerant, solvent, lubricant, insulating material, uye coolant yemachubhu e infrared detector. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gasi rine chepfu, rinonyanya kushandiswa semushonga wezvipembenene. Nekuti sulfuryl fluoride ine hunhu hwekupararira kwakasimba uye kupinda kwemvura, mushonga wezvipembenene wakafara, dosi shoma, huwandu hushoma hwemasalela, kukurumidza kuuraya zvipembenene, nguva pfupi yekupararira kwegasi, kushandiswa kuri nyore patembiricha yakaderera, hapana mhedzisiro pakukura kwemiti uye chepfu shoma, inonyanya kushandiswa zvakanyanya mumatura, ngarava dzekutakura zvinhu, zvivakwa, madhamu ekuchengetedza, kudzivirira mhou, nezvimwewo. -
Silane (SiH4)
Silane SiH4 igesi risina ruvara, rine chepfu uye rinogara richimanikidzwa zvakanyanya pakupisa kwakajairika uye kumanikidzwa. Silane inoshandiswa zvakanyanya mukukura kwesilicon mu epitaxial, zvinhu zvakagadzirwa ne polysilicon, silicon oxide, silicon nitride, nezvimwewo, masero ezuva, fibers dzemaziso, kugadzirwa kwegirazi rine mavara, uye kuiswa kwemhepo inoputika nemakemikari. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, kuchena kwegasi: 99.999%, inowanzoshandiswa sechikafu chinoburitsa mweya uye segasi repakati. Inowanzoshandiswa mu semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 inoshandiswa panzvimbo yeCF4 kana C2F6, inoshandiswa segasi rekuchenesa uye semiconductor process etching gasi. -
Nitric Oxide (NO)
Gasi reNitric oxide musanganiswa wenitrogen une fomura yemakemikari inonzi NO. Igasi risina ruvara, harinhuhwi, rine chepfu uye harinyungudike mumvura. Nitric oxide ine chepfu zvikuru uye inosangana neoxygen kuti igadzire gasi rinoparadza rinonzi nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas igesi isina ruvara ine hwema hunorwadza. Mvura yayo inonzi hydrochloric acid, inozivikanwawo se hydrochloric acid. Hydrogen chloride inonyanya kushandiswa kugadzira madhayi, zvinonhuwira, mishonga, ma chloride akasiyana-siyana uye zvinodzivisa ngura. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, fomura yemakemikari: C3F6, igesi risina ruvara pakupisa kwakajairika uye kumanikidzwa. Inonyanya kushandiswa kugadzira zvigadzirwa zvakasiyana-siyana zvemakemikari zvine fluorine, mishonga yepakati, zvinodzima moto, nezvimwewo, uye inogonawo kushandiswa kugadzira zvinhu zvepolymer zvine fluorine. -
Amoniya (NH3)
Ammonia yemvura / anhydrous ammonia chinhu chakakosha chemakemikari chine mabasa akasiyana-siyana. Ammonia yemvura inogona kushandiswa semuchina wekuchengetera zvinhu mufiriji. Inonyanya kushandiswa kugadzira nitric acid, urea nedzimwe fetereza dzemakemikari, uye inogonawo kushandiswa sezvinhu zvemishonga nemishonga yezvipembenene. Muindasitiri yekudzivirira, inoshandiswa kugadzira ma propellant eroketi nezvombo.
