Products
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Okisijeni (O2)
Oxygen igasi risina ruvara uye risinganhuhwi. Ndiyo yakajairika elemental fomu yeokisijeni. Nezve tekinoroji, okisijeni inotorwa kubva mumhepo yekunyungudutsa, uye okisijeni mumhepo inokwana 21%. Okisijeni igasi risina ruvara uye risinganhuhwi rine kemikari formula O2, inova ndiyo inonyanya kuzivikanwa fomu reokisijeni. Panonyungudika i -218.4°C, uye painofashaira i -183°C. Haisi nyore kunyungudika mumvura. Inenge 30mL yeokisijeni inonyungudika mu1L yemvura, uye iyo okisijeni yemvura ndeye denga rebhuruu. -
Sulfur Dioxide (SO2)
Sulfur dioxide (sulfur dioxide) ndiyo yakanyanya kuwanda, yakapfava, uye inoshatirisa sulfur oxide ine kemikari formula SO2. Sulfur dioxide igasi risina ruvara uye rakajeka rine hwema hunonhuwa. Inonyungudika mumvura, ethanol uye ether, liquid sulfur dioxide haina kugadzikana, haishande, isingapisi, uye haigadziri musanganiswa unoputika nemhepo. Sulfur dioxide ine bleaching properties. Sulfur dioxide inowanzoshandiswa mumaindasitiri kuita bleach pulp, mvere dzemakwai, sirika, nguwani dzemashanga, etc. Sulfur dioxide inogonawo kutadzisa kukura kwe mold uye mabhakitiriya. -
Ethylene Oxide (ETO)
Ethylene oxide ndeimwe yeakareruka cyclic ether. Iyo inhengo yeheterocyclic. Yayo kemikari formula ndeye C2H4O. Iyo ine muchetura carcinogen uye yakakosha petrochemical chigadzirwa. Iyo makemikari ethylene oxide anoshanda zvakanyanya. Inogona kuita ring-kuvhura yekuwedzera maitiro nemakomponi akawanda uye inogona kuderedza sirivheri nitrate. -
1,3 Butadiene (C4H6)
1,3-Butadiene is an organic compound ine kemikari yeC4H6. Igasi risina ruvara rine kakunhuhwirira uye riri nyore kunyungudika. Iyo haina muchetura uye huturu hwayo hwakafanana neiyo ethylene, asi ine kutsamwa kwakasimba kune ganda uye mucous membranes, uye ine anesthetic effect pakukwirira kwakanyanya. -
Hydrogen (H2)
Hydrogen ine kemikari formula yeH2 uye molecular huremu hwe2.01588. Pasi petembiricha yakajairwa nekumanikidzwa, igasi rinopisa zvakanyanya, risina ruvara, rakajeka, risinganhuhwi uye risingarapike iro rakaoma kunyungudika mumvura, uye harinei nezvinhu zvakawanda. -
Neon (Ne)
Neon igasi risina ruvara, risinganhuhwi, risingabatike risingapike nekemikari formula yeNe. Kazhinji, neon inogona kushandiswa segasi rekuzadza kune mavara neon marambi ekunze ekushambadzira ekuratidzira, uye inogona zvakare kushandiswa kune yekuona mwenje zviratidzo uye voltage regulation. Uye laser gasi musanganiswa zvikamu. Noble magasi akadai Neon, Krypton uye Xenon anogona zvakare kushandiswa kuzadza magirazi zvigadzirwa kuvandudza mashandiro avo kana basa. -
Carbon Tetrafluoride (CF4)
Carbon tetrafluoride, inozivikanwawo setetrafluoromethane, igasi risina ruvara patembiricha yakajairika uye kumanikidza, isinganyungudika mumvura. CF4 gasi parizvino ndiyo inonyanya kushandiswa plasma etching gasi muindasitiri yemicroelectronics. Inoshandiswawo selaser gasi, cryogenic refrigerant, solvent, lubricant, insulating material, uye inotonhorera kune infrared detector tubes. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gasi rine muchetura, rinonyanya kushandiswa semushonga wezvipembenene. Nekuti sulfuryl fluoride ine hunhu hwekupararira kwakasimba uye kupindirana, yakakura-spectrum mishonga yekuuraya zvipembenene, yakaderera dosage, yakaderera yasara huwandu, kukurumidza kuuraya zvipembenene, ipfupi gasi rekuparadzira nguva, kushandiswa kuri nyore pakudziya kwakaderera, kusakanganisa kumera uye kuderera kwehupfu, zvakanyanya. Inonyanya kushandiswa zvakanyanya mumatura, ngarava dzinotakura zvinhu, zvivakwa, madhamu emvura, kudzivirira mujuru, etc. -
Silane (SiH4)
Silane SiH4 igasi risina ruvara, rine muchetura uye rinonyanya kushanda rakadzvanywa gasi patembiricha yakajairika uye kumanikidza. Silane inoshandiswa zvakanyanya mukukura epitaxial yesilicon, mbishi zvinhu zvepolysilicon, silicon oxide, silicon nitride, nezvimwewo, masero ezuva, optical fibers, kugadzira girazi remavara, uye kemikari vapor deposition. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, gasi kuchena: 99.999%, inowanzoshandiswa sezvokudya aerosol propellant uye svikiro gasi. Inowanzoshandiswa semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) process, C4F8 inoshandiswa sechinotsiva CF4 kana C2F6, inoshandiswa sekuchenesa gasi uye semiconductor process etching gasi. -
Nitric oxide (NO)
Nitric oxide gasi musanganiswa wenitrogen ine kemikari formula NO. Igasi risina ruvara, risinganhuhwi, rine chepfu risinganyunguriki mumvura. Nitric oxide ikemikari inoshanda zvakanyanya uye inopindirana neokisijeni kuumba gasi rinoparadza nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gasi igasi risina ruvara uye rinonhuwa. Mushonga wayo une aqueous unonzi hydrochloric acid, inozivikanwawo se hydrochloric acid. Hydrogen chloride inonyanya kushandiswa kugadzira dhayi, zvinonhuhwirira, mishonga, akasiyana chlorides uye corrosion inhibitors.
