Zvigadzirwa
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Okisijeni (O2)
Okisijeni igesi isina ruvara uye isina hwema. Ndiyo mhando inonyanya kushandiswa yeokisijeni. Kana tichitaura nezve tekinoroji, okisijeni inotorwa kubva mukuita kwemhepo inonyunguduka, uye okisijeni iri mumhepo inoita 21%. Okisijeni igesi isina ruvara uye isina hwema ine fomura yemakemikari O2, inova ndiyo inonyanya kushandiswa yeokisijeni. Nzvimbo yekunyunguduka ndeye -218.4°C, uye nzvimbo yekufashaira ndeye -183°C. Hainyungudike nyore mumvura. Inenge 30mL yeokisijeni inonyungudutswa mu1L yemvura, uye okisijeni yemvura yakaita bhuruu redenga. -
Sarufa Dioxide (SO2)
Sulfur dioxide (sulfur dioxide) ndiyo inonyanya kushandiswa, iri nyore, uye inotsamwisa sulfur oxide ine fomura yemakemikari SO2. Sulfur dioxide igesi isina ruvara uye inoonekera ine hwema hunorwadza. Inonyungudika mumvura, ethanol ne ether, mvura inonzi sulfur dioxide haina kugadzikana, haishande, haitsvi, uye haiumbi musanganiswa unoputika nemhepo. Sulfur dioxide ine hunhu hwekutsvukisa. Sulfur dioxide inowanzo shandiswa mumaindasitiri kutsvukisa pulp, wool, silk, straw hets, nezvimwewo. Sulfur dioxide inogonawo kudzivirira kukura kwefungus nemabhakitiriya. -
Ethylene Oxide (ETO)
Ethylene oxide ndeimwe ye ethers dziri nyore kushandisa. Inhengo ye heterocyclic. Fomura yayo yemakemikari iC2H4O. Inokonzera kenza ine chepfu uye chigadzirwa chakakosha che petrochemical. Hunhu hwemakemikari e ethylene oxide hunoshanda zvikuru. Inogona kuita ring-opening addition reactions ine makemikari akawanda uye inogona kuderedza silver nitrate. -
1,3 Butadiene (C4H6)
1,3-Butadiene chinhu chinobva mumakemikari chine fomura yemakemikari yeC4H6. Igasi risina ruvara rine hwema hushoma uye zviri nyore kunyungudutsa. Harina chepfu shoma uye chepfu yaro yakafanana neye ethylene, asi rine kutsamwa kwakanyanya paganda nemukati memukati, uye rine simba rekudzivirira kurwadziwa kana rakawanda. -
Hydrogen (H2)
Hydrogen ine fomura yemakemikari yeH2 uye huremu hwemorekuru hwe2.01588. Kana tembiricha nekumanikidzwa kwakajairika, igesi rinobvira moto zvakanyanya, risina ruvara, rinoonekera, harinhuwi uye harina kunaka rinonetsa kunyungudika mumvura, uye harisangani nezvinhu zvakawanda. -
Neon (Ne)
Neon igesi risingawanzoonekwi risina ruvara, harinhuwi, haribatike rine fomura yemakemikari yeNe. Kazhinji, neon inogona kushandiswa segasi rinozadza mwenje yeneon ine mavara ekuratidzira kushambadzira kwekunze, uye inogona kushandiswawo pakuratidza chiedza chinoonekwa uye kudzora voltage. Uye zvikamu zvemusanganiswa wegesi relaser. Magasi akanaka akadai seNeon, Krypton neXenon anogonawo kushandiswa kuzadza zvigadzirwa zvegirazi kuti zvivandudze mashandiro azvo kana basa razvo. -
Kabhoni Tetrafluoride (CF4)
Carbon tetrafluoride, inozivikanwawo setetrafluoromethane, igesi risina ruvara kana tembiricha yakajairika uye kumanikidzwa, isinganyungudike mumvura. Gasi reCF4 parizvino ndiro gasi rinoshandiswa zvakanyanya muindasitiri ye microelectronics. Rinoshandiswawo segasi re laser, cryogenic refrigerant, solvent, lubricant, insulating material, uye coolant yemachubhu e infrared detector. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, gasi rine chepfu, rinonyanya kushandiswa semushonga wezvipembenene. Nekuti sulfuryl fluoride ine hunhu hwekupararira kwakasimba uye kupinda kwemvura, mushonga wezvipembenene wakafara, dosi shoma, huwandu hushoma hwemasalela, kukurumidza kuuraya zvipembenene, nguva pfupi yekupararira kwegasi, kushandiswa kuri nyore patembiricha yakaderera, hapana mhedzisiro pakukura kwemiti uye chepfu shoma, inonyanya kushandiswa zvakanyanya mumatura, ngarava dzekutakura zvinhu, zvivakwa, madhamu ekuchengetedza, kudzivirira mhou, nezvimwewo. -
Silane (SiH4)
Silane SiH4 igesi risina ruvara, rine chepfu uye rinogara richimanikidzwa zvakanyanya pakupisa kwakajairika uye kumanikidzwa. Silane inoshandiswa zvakanyanya mukukura kwesilicon mu epitaxial, zvinhu zvakagadzirwa ne polysilicon, silicon oxide, silicon nitride, nezvimwewo, masero ezuva, fibers dzemaziso, kugadzirwa kwegirazi rine mavara, uye kuiswa kwemhepo inoputika nemakemikari. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, kuchena kwegasi: 99.999%, inowanzoshandiswa sechikafu chinoburitsa mweya uye segasi repakati. Inowanzoshandiswa mu semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 inoshandiswa panzvimbo yeCF4 kana C2F6, inoshandiswa segasi rekuchenesa uye semiconductor process etching gasi. -
Nitric Oxide (NO)
Gasi reNitric oxide musanganiswa wenitrogen une fomura yemakemikari inonzi NO. Igasi risina ruvara, harinhuhwi, rine chepfu uye harinyungudike mumvura. Nitric oxide ine chepfu zvikuru uye inosangana neoxygen kuti igadzire gasi rinoparadza rinonzi nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas igesi isina ruvara ine hwema hunorwadza. Mvura yayo inonzi hydrochloric acid, inozivikanwawo se hydrochloric acid. Hydrogen chloride inonyanya kushandiswa kugadzira madhayi, zvinonhuwira, mishonga, ma chloride akasiyana-siyana uye zvinodzivisa ngura.
