Dry Etching tekinoroji ndeimwe yeakakosha maitiro. Dry Etching Gasi chikamu chakakosha muMicononductor kugadzira uye yakakosha gasi sosi yePlasma etching. Maitiro ayo anokanganisa zvakananga kunaka uye kuita kwechigadzirwa chekupedzisira. Chinyorwa ichi chinonyanya kugovana ndezvipi zviri zvinowanzoitwa etching magasi mune yakaoma etching maitiro.
Fluorine-based magasi: sengecarbon tetrafluoride (cf4), hexafluoroeroethane (c2f6), Trifluoromethane (CF3ORropropropane (C3F8). Aya magasi anogona kuita zvinobudirira zvinounza madhiri akaomeswa kana etching silicon uye silicon compound, nekudaro achiwana kubviswa kwemidziyo.
Kllorine-yakavakirwa magasi: senge chlorine (CL2),Boron Trisloride (BCL3)uye silicon tetrachloride (Sicll4). Masheru-based magasi anogona kupa Chloride ion panguva yekuita maitiro, iyo inobatsira kugadzirisa iyo etching rate uye kusarudza.
Bromine-based magasi: akadai secroman (br2) uye bromine iodide (IBR). Bromine-yakavakirwa magasi inogona kupa zviri nani kuita kuita zviri nani mune mamwe maitiro ekuita, kunyanya kana uchiita zvinhu zvakaoma senge silicon carbide.
Nitrogen-based magasi-yakavakirwa magasi: senge nitrogen trifluoride (NF3) uye oxygen (O2). Aya magasi anowanzo shandiswa kugadzirisa mamiriro ekuita mumamiriro ekugadzirisa ekugadzirisa kuti avandudze kusarudza uye kutungamira kwesching.
Aya magasi anowana chairo kana kugadzirira kwezvinhu zvekusanganisa kwemukati kuburikidza nekubatanidzwa kwekupedza muviri uye makemikari pane plasma etching. Sarudzo yeTching gasi inoenderana nerudzi rwezvinhu zvekutemwa, izvo zvisarudzo zvinodikanwa zveEtching, uye chiyero chaunoda.
Post Nguva: Kukadzi-08-2025
