Ndeapi anowanzo shandiswa etching magasi mune yakaoma etching?

Dry etching tekinoroji ndeimwe yeakakosha maitiro. Dry etching gasi chinhu chakakosha mukugadzira semiconductor uye yakakosha gasi sosi yeplasma etching. Kuita kwayo kunobata zvakananga kunaka uye kushanda kwechigadzirwa chekupedzisira. Ichi chinyorwa chinonyanya kugovera izvo zvinowanzo shandiswa etching magasi mune yakaoma etching process.

Fluorine-based magasi: akadaikabhoni tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) uye perfluoropropane (C3F8). Aya magasi anogona kunyatso kuburitsa fluoride inoputika kana ichiisa silicon nesilicon makomisheni, nekudaro kuwana kubviswa kwezvinhu.

Chlorine-based magasi: akadai seklorini (Cl2),boron trichloride (BCl3)uye silicon tetrachloride (SiCl4). Chlorine-yakavakirwa magasi anogona kupa chloride ions panguva yekugadzira etching, iyo inobatsira kuvandudza etching rate uye kusarudza.

Bromine-based magasi: akadai sebromine (Br2) uye bromine iodide (IBr). Bromine-based magasi anogona kupa zvirinani etching kuita mune mamwe etching maitiro, kunyanya kana uchiisa zvinhu zvakaoma sesilicon carbide.

Nitrogen-based uye oxygen-based magasi: akadai senitrogen trifluoride (NF3) uye oksijeni (O2). Aya magasi anowanzo shandiswa kugadzirisa maitiro ekuita mune etching process kuvandudza kusarudza uye kutungamira kweiyo etching.

Aya magasi anowana chaiyo etching yechinhu chepamusoro kuburikidza nemusanganiswa wekupopota kwemuviri uye kuita kwemakemikari panguva yeplasma etching. Sarudzo ye etching gasi inoenderana nerudzi rwezvinhu zvinozoiswa, iyo yekusarudza zvinodiwa zveetching, uye yaunoda etching rate.