Epitaxial (kukura)Yakasanganiswas
MuSemiconductor Indasitiri, gasi raishandiswa kukura rimwe kana kupfuura zvikamu zvezvinyorwa nemakemikari apor position pane yakanyatsosarudzwa subita inotsanangurwa gasi.
Inowanzo shandiswa silicon epidaxial magasi anosanganisira dichlosorosilane, silicon tetrachloride uyeSilane. Kunyanya kushandiswa Epitaxial silicon deposition, Silicon oxide film deposition, etc.Commasoxsope, etc. Epitaxy chiitiko icho chimwe chekristaro chinoiswa uye chakakura pamusoro peiyo substrate.
Chemical Vapor Deposition (CVD) yakasanganiswa gasi
CVD inzira yekuisa zvimwe zvinhu uye makomputa negesi yegemasemical phassion uchishandisa mishonga yefirimu, kureva kuti nzira yekugadzira yefirimu uchishandisa gasi chikamu chemakemikari. Zvichienderana nemhando yefirimu yakaumbwa, iyo makemikari apor deposition (CVD) gasi rinoshandiswa zvakare rakasiyana.
DopingYakasanganiswa gasi
Muchigadzirwa cheMicononductor zvishandiso uye zvimiro zvinosanganiswa, zvimwe zvakasvibiswa zvinotsanangurwa mumhando yeMicononder
Kunyanya kusanganisira arsine, phosphine, phosphine, phosphorus trifluoride, phosphorus trifluoride, phosphorus trifluoride, phosphorous pentafluoride, arsenic trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Trifluoride, ArsenicideBoron Trifluoride, Dibhorani, nezvimwe.
Kazhinji, iyo doping sosi yakasanganiswa neyekutakura gasi (senge argon ne nitrogen) mune inopa kabinet. Mushure mekusanganisa, kuyerera kwegesi kunoenderera mberi kuiswa muvheni
EtchingMusanganiswa wegesi
Etching ndeyekuenda kuFleting Scours (sesimbi yefirimu, silicon oxide firimu, nezvimwechete isina iyo nzvimbo ine areporesist masking, kuitira kuti uwane maitiro ekufungidzira ekufungidzira pane substrate.
Etching nzira dzinosanganisira yakanyorova makemikari etching uye yakaoma makemikari etching. Iyo gasi rinoshandiswa mumakemikari akaoma etching anonzi etching gasi.
Etching gasi rinowanzo famba fluoride gasi (halide), sengekabhoni tetrafluoride, Nitrogen Trifluoride, Trifluorhane, HexafluorooroThane, perfluoropropropane, nezvimwe.
Kutumira Nguva: Nov-22-2024