Epitaxial (kukura)Mixed Gas

Muindasitiri yesemiconductor, gasi rinoshandiswa kurima rimwe kana mamwe akaturikidzana nemakemikari vapor deposition pane yakanyatsosarudzwa substrate inonzi epitaxial gas.

Inowanzo shandiswa silicon epitaxial magasi anosanganisira dichlorosilane, silicon tetrachloride uyesilane. Inonyanya kushandiswa epitaxial silicon deposition, silicon oxide film deposition, silicon nitride film deposition, amorphous silicon film deposition for solar cells nemamwe photoreceptors, etc. Epitaxy inzira iyo imwe crystal material inoiswa uye inokura pamusoro pe substrate.

Chemical Vapor Deposition (CVD) Yakasanganiswa Gasi

CVD inzira yekuisa zvimwe zvinhu uye makomisheni negasi chikamu chemakemikari reactions uchishandisa volatile compounds, kureva, nzira yekugadzira firimu uchishandisa gasi chikamu chemakemikari reactions. Zvichienderana nerudzi rwefirimu rakaumbwa, kemikari vapor deposition (CVD) gasi rinoshandiswa rakasiyanawo.

DopingYakasanganiswa Gasi

Mukugadzira semiconductor midziyo uye Integrated circuits, zvimwe tsvina vari doped kupinda semiconductor zvinhu kupa zvinhu zvinodiwa conductivity mhando uye imwe resistivity kugadzira resistors, PN junctions, akavigwa akaturikidzana, etc. The gasi rinoshandiswa doping muitiro anonzi doping gasi.

Kunyanya inosanganisira arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, etc.

Kazhinji, iyo doping sosi inosanganiswa neanotakura gasi (senge argon uye nitrogen) mune sosi kabati. Mushure mekusanganisa, kuyerera kwegasi kunoramba kuchipinzwa muchoto chekuparadzira uye kutenderedza wafer, kuisa dopants pamusoro pechifukidziro, uyezve kuita nesilicon kugadzira simbi dzakashongedzwa dzinotamira musilicon.

EtchingGasi Musanganiswa

Etching ndeyekubvisa nzvimbo yekugadzirisa (senge simbi firimu, silicon oxide firimu, nezvimwewo) pane substrate isina photoresist masking, uchichengetedza nzvimbo ine photoresist masking, kuitira kuti uwane inodiwa yekufungidzira pateni pane substrate pamusoro.

Etching nzira dzinosanganisira yakanyorova makemikari etching uye yakaoma kemikari etching. Iyo gasi inoshandiswa mukuoma kwemakemikari etching inonzi etching gas.

Etching gasi rinowanzoita fluoride gasi (halide), sengecarbon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, nezvimwewo.